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Created with Pixso. 4H-N Type SiC Substrate 10x10mm Wafer for Power Electronics

4H-N Type SiC Substrate 10x10mm Wafer for Power Electronics

Ονομασία μάρκας: ZMSH
Αριθμός μοντέλου: Υπόστρωμα SiC 10 × 10 mm
MOQ: 25
τιμή: by case
Χρόνος παράδοσης: 2-4 εβδομάδες
Όροι πληρωμής: T/T
Λεπτομέρειες
Τόπος καταγωγής:
Κίνα
Πιστοποίηση:
rohs
Τύπος:
4H-SiC
Τυπικές Διαστάσεις:
10×10 χιλ. (ανοχή ±0.05 χιλ.)
Επιλογές πάχους:
100-500 μm
Αντίσταση:
0.01-0.1 Ω·cm
Θερμική αγωγιμότητα:
490 W/m·K (τυπικό)
Εφαρμογές Συσκευών:
Συστήματα μετάδοσης κίνησης νέων ενεργειακών οχημάτων, Αεροδιαστημικά ηλεκτρονικά
Συσκευασία λεπτομέρειες:
πακέτο σε αίθουσα καθαρισμού 100 βαθμών
Δυνατότητα προσφοράς:
1000pcs το μήνα
Περιγραφή προϊόντων
10×10mm 4H-N Type SiC Substrate: Technical Overview and Applications

High-Performance Semiconductor Solution for Advanced Electronics


1. Product Overview

The 10×10mm 4H-N type silicon carbide (SiC) substrateis a high-performance semiconductor material based on third-generation SiC technology. Manufactured via Physical Vapor Transport (PVT)or High-Temperature Chemical Vapor Deposition (HTCVD), it offers exceptional thermal, electrical, and mechanical properties. With a dimensional tolerance of ±0.05 mmand surface roughness Ra < 0.5 nm, it is ideal for prototyping power devices, RF components, and optoelectronic systems. The substrate is available in 4H-SiCor 6H-SiCpolytypes, with N-type or P-type doping options, and undergoes rigorous quality inspections (e.g., XRD, optical microscopy) to ensure semiconductor-grade reliability.


2. Technical Specifications

Table 1: Key Parameters of 10×10mm 4H-N Type SiC Substrate

Parameter Category

Specifications

Material Type

4H-SiC, N-type doped

Dimensions

10×10 mm (±0.05 mm tolerance)

Thickness Options

100–500 μm

Surface Roughness

Ra < 0.5 nm (polished, epitaxial-ready)

Electrical Properties

Resistivity: 0.01–0.1 Ω·cm; Carrier Concentration: 1×10¹⁸–5×10¹⁹ cm⁻³

Crystal Orientation

(0001) ±0.5° (standard)

Thermal Conductivity

490 W/m·K (typical)

Defect Density

Micropipe Density: <1 cm⁻²; Dislocation Density: <10⁴ cm⁻²

Customization

Non-standard shapes, doping profiles, backside metallization




3. Key Advantages of SiC Substrates
  • Superior Thermal Management: With a thermal conductivity of 490 W/m·K(3× higher than silicon), the substrate enables efficient heat dissipation, reducing device operating temperatures and enhancing system longevity.

  • High Voltage Tolerance: A breakdown field strength of 2–4 MV/cm(10× higher than silicon) supports high-power applications, while a high electron saturation drift velocity (2×10⁷ cm/s) benefits high-frequency designs.

  • Mechanical Robustness: Vickers hardness of 28–32 GPaand flexural strength >400 MPaprovide 5–10× longer service life than conventional materials.

  • Environmental Stability: Operational temperatures up to 600°Cand a low thermal expansion coefficient (4.0×10⁻⁶/K) ensure performance in extreme conditions.


4. Applications in Advanced Technologies

Table 2: Core Application Areas of 10×10mm SiC Substrates

Application Field

Use Cases

Benefits

Electric Vehicles

Powertrain inverters, SiC MOSFETs/ diodes

3–5% higher inverter efficiency, extended EV range

5G Infrastructure

RF power amplifiers (mmWave bands: 24–39 GHz)

>20% reduction in base station power consumption

Smart Grids

HVDC systems, solid-state transformers

Improved power transmission efficiency

Industrial Automation

High-power motor drives (switching frequency >100 kHz)

50% smaller device size

Aerospace & Defense

Satellite power systems, engine controls

Reliability in extreme temperatures/radiation

Optoelectronics

UV LEDs, laser diodes

Optimal substrate due to wide bandgap and thermal stability


5. Customization Options
  • Geometry: Round, rectangular, or user-defined shapes.

  • Doping: N-type or P-type with concentrations from 10¹⁵ to 10¹⁹ cm⁻³.

  • Thickness: 100–500 μm, with optional backside metallization for improved integration.


6. Conclusion

The 10×10mm 4H-N type SiC substrate combines advanced material properties with flexibility in design, making it a critical enabler for next-generation electronics in automotive, communication, and energy systems. Its compatibility with high-temperature, high-frequency, and high-power applications positions it as a cornerstone of semiconductor innovation.


Tags: #SiC #4H-SiC #PowerElectronics #Semiconductor #Wafer #10x10mm #ThermalManagement

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