SiC Cantilever Paddle with CVD Coating for Horizontal Boat Loading​​

SiC Cantilever Paddle with CVD Coating for Horizontal Boat Loading​​

A Silicon Carbide (SiC) Cantilever Paddle is a high-performance ceramic structural component manufactured using ​​reaction-bonded silicon carbide (RBSiC) process. It is primarily designed for ​​carrying and transporting wafers​​ in high-temperature process environments within the ​​semiconductor and photovoltaic industries​​. It operates reliably in atmospheres containing ​​oxygen, nitrogen, and trace hydrogen chloride​​, withstanding temperatures of approximately ​​1250°C​​ for ​​long-term stable operation​​. Leveraging the exceptional material properties of silicon carbide—​​extremely high hardness, high flexural strength, low coefficient of thermal expansion, excellent thermal stability, and chemical inertness​​—the cantilever paddle ensures ​​uniform heating, prevention of deformation, and reduction of contamination and particle generation​​ in wafers under high temperatures. It significantly ​​extends service life, increases load capacity and production efficiency, and reduces overall maintenance costs​​. Its ​​lightweight design and ​​high surface smoothness​​ also support precise automated robotic handling, meeting high-precision process requirements.

SiC Cantilever Paddle Key Parameters

The following are the core performance parameters of silicon carbide cantilever paddles, directly related to their material characteristics, functions, and applications:

SiC Cantilever Paddle Features

1. ​​3D printing integrated forming​​.

2. ​​Base material impurity content <300 ppm​​.

3. ​​CVD silicon carbide coating base material impurity content <5 ppm​​.

4. ​​High load-bearing capacity at high temperatures​​.

5. ​​High thermal shock stability​​.

SiC Cantilever Paddle Applications

• ​​Photovoltaic Industry​​: Used in ​​TOPCon cell​​ production processes such as ​​LPCVD and PECVD​​ to carry silicon wafers for ​​doping and passivation layer deposition​​. Also employed in diffusion furnaces for ​​high-temperature oxidation and annealing​​ of silicon wafers, enhancing cell conversion efficiency.

• ​​Semiconductor Manufacturing​​: Serves as a ​​core component of wafer carriers​​ in processes like ​​chemical vapor deposition (CVD) and etching​​, ensuring process stability and yield.
• ​​New Energy Material Preparation​​: Used in high-temperature crystal growth furnaces for ​​silicon carbide single crystal growth​​, supporting SiC ingots and resisting molten silicon corrosion environments.
• ​​Other Industrial Fields​​: Functions as high-temperature supports in applications such as ​​ceramic sintering and glass melting​​.

​​Q1: What is a silicon carbide cantilever paddle and what is it used for?​​

​​A1:​​ A silicon carbide cantilever paddle is a ​​high-performance ceramic component​​ used primarily in ​​semiconductor and photovoltaic manufacturing​​ to ​​carry and transport wafers​​ in high-temperature processes like LPCVD and diffusion, ensuring precise handling and minimal contamination under extreme conditions (up to 1350°C).

​​Q2: Why choose silicon carbide for cantilever paddles over traditional materials?​​

​​A2:​​ Silicon carbide offers ​​exceptional thermal stability (low CTE ~4.5×10⁻⁶/℃), high hardness (Mohs 9), and mechanical strength (>2500 MPa)​​, enabling ​​longer service life (3-5x longer than quartz), reduced maintenance costs, and superior performance in corrosive and high-temperature environments​​.

Tags: #SiC Cantilever Paddle, #CVD Coating, #High-Purity, #Customized, #SiC Ceramics​​, #​Horizontal Boat Loading​​, #Wafer Carriers​​